Please see the attached problem.
2. Yaschchin (1995) discusses a process for the chemical etching of silicon wafers used in itegrated circuits. This company wishes to detect an increase in the thickness of the silicon oxide layers because thicker layers require longer etching times. Process specifications state a target value of 1 micron for the true mean thickness. Historically, the layer thickness have a standard deviation of 0.06 micron.
b. Find the p-value associaite with the test in part a.
c. Construct a 95% confidence interval for this situation. Use this interval to determine whether the true mean thickness has changed. Discuss the relationship of the 95% confidence interval and the corresponding hypothesis test.
The solution provides step by step method for the calculation of testing of hypothesis and confidence interval for population mean. Formula for the calculation and Interpretations of the results are also included. Interactive excel sheet is included. The user can edit the inputs and obtain the complete results for a new set of data.